INDUSTRY ANALYSIS
SAP and mSAP for PCBs: How Fine Traces Are Made, and What Has Changed by 2026
Smartphone mainboards, optical communications modules, and IC package substrates must connect more signals within limited space. As traces shrink, the traditional method of starting with a full copper layer and etching away the excess struggles to maintain linewidth, cross-sectional shape, and yield. The semi-additive process (SAP) and modified semi-additive process (mSAP) are two common approaches to fine-line fabrication. Both establish a very thin conductive base, plate copper only where the circuits are needed, and then remove the base copper between traces.
| Process | How traces are formed | Common applications and process characteristics |
|---|---|---|
| Conventional subtractive process | Start with copper-clad laminate, protect the intended traces, and etch away the other copper | Mature and relatively inexpensive. Thicker copper and finer traces make undercutting and linewidth control more difficult. |
| mSAP | Start with very thin copper foil, laminate dry film, expose and develop it, then pattern-plate the openings. Strip the resist and briefly “flash etch” the base copper between traces | Common in high-density interconnect (HDI) boards, substrate-like PCBs (SLPs), and some flexible circuits. Balances fine-line capability with the extension of existing PCB production lines. |
| SAP | Start with an unclad insulating build-up material, treat the surface, and form an extremely thin seed layer using electroless copper or another method. Pattern-plate, strip the resist, and remove the seed layer | Common in package substrates requiring finer traces, and also used in advanced flexible circuits. Demands strong seed-layer adhesion, microvia copper coverage, and cleanliness. |
Mitsui Mining & Smelting's process comparison uses approximately 1–3 μm of base copper for mSAP and a 0.5–1 μm seed layer for SAP as examples. GS Swiss PCB describes capabilities of approximately 20–60 μm for mSAP and 10 μm or finer for SAP. These are technical descriptions from different suppliers and products, not universal industry boundaries. Materials, copper thickness, layer count, and acceptable yield all affect actual production specifications. [1][2]
For a SAP build-up layer containing microvias, a simplified sequence is: laminate the insulating layer → laser-drill and desmear → activate and form the seed layer → laminate dry film, expose, and develop → pattern-plate traces and vias → strip dry film → selectively remove exposed seed copper → perform optical and electrical inspection. mSAP follows a similar sequence but generally starts with carrier-supported ultrathin copper foil. Depending on the design, hole metallization, via filling, and surface pre-plating may also be included. “Additive” does not mean completely free of etching: final seed-layer removal remains critical to linewidth control. [1][2][7]
What has changed by 2026?
First, the objective has moved from making fine traces to producing them consistently across more layers and larger areas. SAP has long been used in IC package substrates; mSAP was not invented in 2026 either. Discussions once often reduced fine-line capability to minimum line/space (L/S). Advanced smartphone HDI, SLPs, and AI/high-performance-computing packages now simultaneously test multilayer registration, microvia reliability, copper-thickness uniformity, and defect rates. AT&S's 2026 discussion of mSAP places it in this context of miniaturization and high-speed data connectivity. [3][4]
Second, imaging, dry film, and inspection must improve together. As spacing shrinks, dry-film adhesion, opening sidewalls, compensation for dimensional changes, and defect detection all directly affect the finished copper traces. KLA introduced direct-imaging and inspection solutions for large, high-layer-count organic substrates in 2024. Qnity demonstrated dry film for direct imaging of fine substrate traces in 2025. In 2026, SCREEN introduced equipment that uses lasers to remove shorts and excess copper. These dates describe product announcements. Equipment resolution or demonstration-sample figures cannot be treated as customer-product volume-production yields. [5][6][8]
Third, thinner base copper makes the process window increasingly dependent on coordination across operations. A thin seed layer reduces erosion of plated traces during flash etching and helps preserve a more rectangular profile. Yet continuous conductivity and adhesion must still be maintained at microvia sidewalls and bottoms. A solution described by MKS/Atotech in 2025 integrates laser drilling, electroless copper, electroplating, and differentiated etching for advanced SAP and mSAP. Its public information refers to supporting advanced SAP development at ≤5/5 μm. This is a development direction, not evidence that ordinary PCB factories routinely mass-produce 5/5 μm circuitry. [7]
Fourth, new methods address the conflicting requirements of a thin surface layer and sufficient copper coverage inside the via. In June 2026, Elephantech announced DS-SAP: it first forms an ultrathin seed layer on the insulating surface, then uses copper nanoparticle ink to improve conductive coverage inside microvias. Published material shows cross-sections and subsequent plating results. It should currently be treated as a publicly demonstrated process direction, not a production standard that has comprehensively replaced established SAP. [9]
Five challenges for PCB, CCL, and substrate suppliers
1. Materials must combine low loss with adhesion. High-speed signals favor smooth copper surfaces and low-dielectric-loss materials, but reducing roughness too far can make copper-to-resin bonding more difficult. Ultrathin copper foil for mSAP and insulating build-up films for SAP must balance roughness, peel strength, heat resistance, and dimensional stability. CCL and materials suppliers must evaluate more than Dk and Df: they need joint validation with downstream laser drilling, desmear, seed-layer formation, and plating conditions. [10][11]
2. Flash-etch tolerance is shrinking. Residual seed copper between traces can cause shorts. Excessive etching narrows traces, damages sidewalls, and may open fine conductors. Base-copper thickness and uniformity, etchant condition, and line speed consequently become more important. This is why thin seed layers and highly selective etchants continue to receive attention. [1][7][9]
3. Microvias and surface traces cannot be optimized separately. Excess surface copper makes fine-line flash etching harder, while insufficient copper can leave discontinuities at via bottoms. Incomplete filling affects stacked-via and thermal-cycle reliability. Equipment suppliers, chemistry suppliers, and board manufacturers must jointly verify hole diameter, aspect ratio, desmear, electroless copper coverage, fill dimples, and reliability testing. An attractive circuit cross-section alone is insufficient for qualification. [7][9][12]
4. Larger boards and more layers amplify registration problems and yield losses. Every additional fine-line and microvia layer introduces opportunities for dimensional change, warpage, misregistration, and contamination to accumulate into scrap. Turning fine-line capability into reliable delivery requires process-capability statistics, linewidth and copper-thickness measurements, AOI defect classification, electrical testing, and traceability across operations. [5]
5. Investment and quotations must reflect a complete, production-capable specification. Ultrathin copper foil, low-loss build-up materials, high-resolution imaging, clean environments, precision plating, and inspection all require investment. Achieving a minimum L/S at one point does not establish a competitive whole board. Better questions when assessing a job include: Which layers use SAP/mSAP? What L/S can be produced at the specified copper thickness, hole diameter, board dimensions, and layer count? How are registration tolerance, reliability, and yield validated? These questions reveal more about cost and lead time than the smallest advertised number. [1][5][7]
What the transition means
The evolution from subtractive processing to mSAP and SAP does not mean every PCB should pursue the same minimum linewidth. It gives different products suitable ways to achieve the required density. By 2026, competition extends to coordinated control of material interfaces, microvias, imaging, plating, flash etching, and inspection. For manufacturers, the real barrier is delivering sufficient yield and reliability consistently under the customer's complete board specifications.
Sources & notes
- References [1]–[12] follow the order of the Chinese article's source list. No URLs have been inferred where none were supplied.
- [1] GS Swiss PCB, Modified Semi-Additive Process (mSAP) and Semi-Additive Process (SAP). Compares the three processes, cross-sections, and applications; includes a 2024 SAP flexible-circuit production example.
- [2] Mitsui Mining & Smelting, MicroThin technical presentation, Appendix 1, page 33. Compares subtractive, mSAP, and SAP flows and seed-layer thicknesses.
- [3] AT&S, Rethinking the basics of PCB and IC Substrate manufacturing with mSAP, March 2026.
- [4] Taiwan Ministry of Economic Affairs, Department of Industrial Technology / ITIS, 2025 Taiwan advanced PCB technology development trends. Circuit-fabrication approaches and principal applications.
- [5] KLA, KLA Unveils Comprehensive IC Substrate Portfolio, October 2024. Direct imaging, inspection, metrology, and process control.
- [6] Qnity, Advanced Semiconductor and PCB Solutions at productronica 2025, November 2025. Direct-imaging dry films for substrates and HDI via-fill materials.
- [7] MKS/Atotech, TPCA Show & IMPACT Conference 2025 technical announcement, October 2025. See also Printoganth MV TP1 and EcoFlash S300 descriptions of hole metallization and flash etching.
- [8] SCREEN PE Solutions, SpairD PCB repair-equipment announcement, March 2026.
- [9] Elephantech, DS-SAP technical release (PDF), June 2026. Public demonstration of separate treatment of surface and via seed layers.
- [10] SEKISUI, build-up insulating films for FC-BGA. Trade-offs involving low loss, post-desmear surfaces, adhesion, and warpage.
- [11] MacDermid Alpha, M-Speed HF. Surface treatment addressing low roughness and adhesion.
- [12] MacDermid Alpha, MacuSpec VF-TH 500. Reliability requirements for mSAP pattern plating, via filling, and through-hole plating.